Loading patent…
AssigneeTokyo Ohka Kogyo Co., Ltd.
InventorsKoshi Onishi, Takashi Nagamine, Yuuki Fujimoto
Estimating the term…
A resist composition including a resin component having a solubility in a developing solution that changes by an action of an acid, in which the resin component has a constitutional unit represented by General Formula (a0-1). In General Formula (a0-1), R01 and R02 are each independently an alkyl group, a halogenated alkyl group, or a hydrogen atom; Rar is an aromatic ring which may have a substituent; L1 and L2 are each independently a single bond or divalent linking group; R03 represents a fluorinated alkyl group having 1 to 5 carbon atoms, a fluorine atom, or a hydrogen atom; no represents an integer of 1 or greater as long as a valence is allowed; Mm+ represents an m-valent onium cation; and m represents an integer of 1 or greater.
A resist composition which generates an acid upon light exposure and whose solubility in a developing solution is changed by an action of the acid, the resist composition comprising:
A compound represented by General Formula (a0-m1),
A polymer compound having a constitutional unit represented by General Formula (a0-1),
Dependencies are inferred from the claim text.