A light generating system comprising a first light generating device, a second light generating device, a luminescent material, first optics, a polarization control element, a diffuser element, a polarization changing element, and central optics, wherein:
- the first light generating device is configured to generate first device light;
- wherein the first light generating device comprises a first light source selected from a laser diode and a superluminescent diode;
- wherein the first device light has a first peak wavelength λ1;
- the second light generating device is configured to generate second device light, wherein the second device light comprises one or more of polarized light having a p polarization and polarized light having an s polarization;
- wherein the second light generating device comprises a second light source selected from a laser diode and a superluminescent diode;
- wherein the second device light has a second peak wavelength λ2;
- wherein |λ1−λ2|≥5 nm;
- the luminescent material is configured to convert first device light and second device light received by the luminescent material into luminescent material light;
- the first optics comprise a first dichroic beam splitter, wherein the first dichroic beam splitter is configured (a) to transmit or reflect at least part of the first device light, and (b) to reflect or transmit at least part of the luminescent material light;
- the polarization control element is configured to control polarization of the second device light;
- the diffuser element is configured to diffuse at least part of the second device light received by the diffuser element thereby providing diffused second device light while maintaining at least part of the polarization of the second device light;
- the polarization changing element is configured in an optical path of the second device light between the central optics and the diffuser element;
- the central optics comprises (i) a central optics polarizing beam splitter, and (ii) a central optics dichroic beam splitter;
- wherein the central optics polarizing beam splitter is configured to transmit and/or reflect at least part of the second device light in dependence of its polarization;
- and wherein the central optics dichroic beam splitter is configured (a) to transmit or reflect at least part of the second device light, and (b) to reflect or transmit at least part of the luminescent material light;
- the light generating system is configured to provide system light comprising diffused second device light and luminescent material light;
- and wherein the light generating system is configured such that in a first operational mode of the light generating system (a) at least part of the first device light irradiates the luminescent material via the first optics, and the luminescent material light escapes from the light generating system via the first optics and the central optics and (b) at least part of the second device light irradiates the diffuser element via the central optics, and at least part of the diffused second device light escapes from the light generating system via the central optics;
- and
- wherein (i) the first dichroic beam splitter is configured (a) to transmit at least 80% of the first device light received by the first dichroic beam splitter, and (b) to reflect at least 80% of the luminescent material light received by the first dichroic beam splitter and at least 80% of the second device light received by the first dichroic beam splitter, or (ii) the first dichroic beam splitter is configured (a) to reflect at least 80% of the first device light received by the first dichroic beam splitter, and (b) to transmit at least 80% of the luminescent material light received by the first dichroic beam splitter and at least 80% of the second device light received by the first dichroic beam splitter;
- wherein the central optics polarizing beam splitter is configured to transmit x % of light having p polarization and reflect y % of light having s polarization, wherein one of x % and y % is selected from the range of 15-80%, and the other one of x % and y % is selected from the range of 85-100%.