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US 2026/0217963 A1Published application
Metal oxide resist pattern-forming organic resin composition
AssigneeNissan Chemical Corporation
InventorsSatoshi TAKEDA, Rikimaru SAKAMOTO
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Abstract
An organic film-forming composition, which is used for forming an organic film that is formed between resist patterns formed from a metal-containing resist film and that is then removed, the organic film-forming composition containing: an organic film constituent component; and a solvent.
Claims21
An organic film-forming composition, which is used for forming an organic film that is formed between resist patterns formed from a metal-containing resist film and that is then removed,
- the organic film-forming composition comprising:
- an organic film constituent component;
- and a solvent.
Dependencies are inferred from the claim text.