Method for cleaning a mask inspection device, mask inspection system, and cleaning station
OwnerTobias Hegeleinventor
Life of this patent
Estimating the term…
Abstract
A method for cleaning a mask inspection device, the mask inspection device comprising a housing and a plurality of EUV mirrors located in the housing. The method involves inserting a cleaning gas generator into an interior space of the housing. The cleaning gas generator produces a cleaning gas jet, the cleaning gas jet being oriented such that the cleaning gas jet strikes an optical surface of an EUV mirror of the mask inspection device. The cleaning gas generator is taken out of the interior space of the housing. The invention also relates to a mask inspection system and to a cleaning station.
Claims20
A method for cleaning a mask inspection device, the mask inspection device comprising a housing and a plurality of EUV mirrors located in the housing, the method comprising the following steps:
- a. inserting a cleaning gas generator into the interior space of the housing;
- b. the cleaning gas generator producing a cleaning gas jet, the cleaning gas jet being oriented such that the cleaning gas jet strikes an optical surface of an EUV mirror of the mask inspection device;
- and
- c. taking the cleaning gas generator out of the interior space of the housing.
A mask inspection system comprising a mask inspection device and a cleaning gas generator for producing a cleaning gas jet, wherein the mask inspection device comprises an image sensor, a housing, and a plurality of EUV mirrors located in the housing, wherein, in a state of use of the mask inspection system, the cleaning gas generator is separated from the mask inspection device and the mask inspection device is configured to receive image data from a photomask by use of the image sensor, and wherein, in a cleaning state, a cleaning gas generator is inserted into an interior space of the mask inspection device such that the cleaning gas jet is directed onto an optical surface of an EUV mirror of the mask inspection device.
A cleaning station comprising a chamber intended for receiving an EUV mirror and a generator unit for producing a cleaning gas jet from hydrogen radicals, wherein the generator unit is configured such that the cleaning gas jet strikes the optical surface of the EUV mirror located in the chamber.
Dependencies are inferred from the claim text.