Substrate processing apparatus

A substrate processing apparatus, comprising:

• a processing tank, for accommodating a plurality of substrates arranged in a column in a horizontal direction, and storing processing liquid for immersing the plurality of substrates, the arrangement direction of the substrates being defined as a Y direction, a horizontal direction parallel to a main surface of the substrate being defined as an X direction, and the X direction and the Y direction being perpendicular to each other;
• a bubbler, disposed in the processing tank, and positioned below the plurality of substrates, for supplying bubbles into the processing liquid, the bubbler including:
• a bubble plate, facing the plurality of substrates, the bubble plate having a plurality of opening holes thereon;
• a bubble chamber, for providing gas to the plurality of opening holes;
• wherein, the inside of the bubble chamber is divided into at least two gas channels independent of each other, and the flow rate of gas supply of the at least two gas channels is independently controlled.