Substrate cleaning device and substrate cleaning method
AssigneeSamsung Electronics Co., Ltd.
InventorsDonghoon KWON, Juhyun LEE, Chungki MIN
Life of this patent
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Abstract
A substrate cleaning method may include preparing a substrate having an upper surface opposite a lower surface, contacting a first roll member and a second roll member to the lower surface and the upper surface of the substrate, respectively, and scrub cleaning the lower surface of the substrate and the upper surface of the substrate by rotating the first roll member and the second roll member. The first roll member and the second roll member each may include a copolymer of a first water-soluble polymer and a second water-soluble polymer. The first water-soluble polymer may include a non-ionic polymer, and the second water-soluble polymer may include a cationic polymer.
Claims20
A substrate cleaning method comprising:
- preparing a substrate having an upper surface opposite a lower surface;
- contacting a first roll member and a second roll member to the lower surface and the upper surface of the substrate, respectively, the first roll member and the second roll member each including a copolymer of a first water-soluble polymer and a second water-soluble polymer;
- and
- scrub cleaning the lower surface of the substrate and the upper surface of the substrate by rotating the first roll member and the second roll member,
- wherein the first water-soluble polymer comprises a non-ionic polymer, and
- wherein the second water-soluble polymer comprises a cationic polymer.
A substrate cleaning method comprising:
- preparing a substrate having an upper surface opposite a lower surface;
- contacting a first roll member and a second roll member to the lower surface and the upper surface of the substrate, respectively, the first roll member and the second roll member each including a copolymer of a first water-soluble polymer and a second water-soluble polymer;
- and
- scrub cleaning the lower surface of the substrate and the upper surface of the substrate by rotating the first roll member and the second roll member while supplying a cleaning solution to the upper surface of the substrate and the lower surface of the substrate,
- wherein the second water-soluble polymer comprises a cationic polymer, and
- wherein the cationic polymer comprises at least one of polyvinylamine, polyethyleneimine, polyvinylimidazole, and polyallylamine.
A substrate cleaning method comprising:
- preparing a substrate having an upper surface opposite a lower surface;
- contacting a first roll member and a second roll member to the lower surface and the upper surface of the substrate, respectively, the first roll member and the second roll member each including a copolymer of a first water-soluble polymer and a second water-soluble polymer;
- and
- scrub cleaning the lower surface of the substrate and the upper surface of the substrate by rotating the first roll member and the second roll member while supplying a cleaning solution to the upper surface of the substrate and the lower surface of the substrate,
- wherein the first roll member and the second roll member each include a copolymer of polyvinyl alcohol and polyvinylamine.
Dependencies are inferred from the claim text.