Back to results
US 2026/0215645 A1Published application
Cleaning base station and cleaning system
AssigneeBeijing Roborock Technology Co., Ltd.
InventorsYongji LONG, Jianhao ZHAO, Yang WANG, Jianqiang SHAN, Yingku LI, Tianliang ZHU
Life of this patent
Estimating the term…
Abstract
A cleaning base station and a cleaning system, are provided. The cleaning base station includes a wastewater discharging part, a liquid collecting part, and a heating assembly, wherein the liquid collecting part communicates with the wastewater discharging part, and the heating assembly is arranged on a side of the wastewater discharging part and configured to provide heat energy for the wastewater discharging part.
Claims20
A cleaning base station, comprising:
- a wastewater discharging part;
- a liquid collecting part communicating with the wastewater discharging part;
- and
- a heating assembly arranged on a side of the wastewater discharging part and configured to provide heat energy for the wastewater discharging part.
1 more element
A cleaning system, comprising:
- a cleaning base station, wherein cleaning base station comprises:
- a wastewater discharging part;
- a liquid collecting part communicating with the wastewater discharging part;
- and
- a heating assembly arranged on a side of the wastewater discharging part and configured to provide heat energy for the wastewater discharging part;
- and
- a cleaning device, the cleaning base station being used for cleaning the cleaning device.
4 more elements
Dependencies are inferred from the claim text.