US 2026/0211331 A1Published application

Resist underlayer film-forming composition

AssigneeNissan Chemical Corporation

InventorsHiroto OGATA, Mamoru TAMURA

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A resist underlayer film-forming composition including a polymer (A) a hydrophobic substituent-containing compound (B), and a solvent (C).

Dependent claims

A resist underlayer film-forming composition comprising a polymer (A), a hydrophobic substituent-containing compound (B), and a solvent (C).

Dependencies are inferred from the claim text.

G03F 7/11
Characterised by structural details, e.g. supports, auxiliary layers: having cover layers or intermediate layers, e.g. subbing layers
C08G 73/0644
With at least three nitrogen atoms in the ring: polytriazines
C08L 79/04
Compositions of macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing nitrogen with…:…
H10P 50/73
Etching of wafers, substrates or parts of devices: using masks for insulating materials

No related US applications are recorded in the indexed filing history.

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