Back to results
US 2026/0211329 A1Published application
Soluble polymer compound, method for producing soluble polymer compound, resin composition, resin composition film, cured film, and electronic component
AssigneeToray Industries, Inc.
InventorsKeigo KATO, Kazuyuki MATSUMURA, Yoshiko TATEOKA
Life of this patent
Estimating the term…
Abstract
Provided is a soluble polymer compound containing a structure having a repeating unit represented by chemical formula (1) and further containing a structure derived from an acid anhydride silane residue:
Claims9
A soluble polymer compound containing a structure having a repeating unit represented by chemical formula (1) and further containing a structure derived from an acid anhydride silane residue,
- wherein the soluble polymer compound contains a structure represented by chemical formula (2), and in the chemical formula (2), the acid anhydride silane residue is derived from a structure represented by chemical formula (4):
- in which A represents a tetravalent tetracarboxylic acid residue having two or more carbon atoms, and B represents a divalent diamine residue having two or more carbon atoms,
- in which A represents a tetravalent tetracarboxylic acid residue having 2 or more carbon atoms, B represents a divalent diamine residue having 2 or more carbon atoms, and n represents an integer of 0 to 3, X represents a structure represented by chemical formula (3), and Y represents a hydrocarbon group having 1 to 10 carbon atoms, and Z represents a silane residue having 1 to 10 carbon atoms,
- in which an oxygen atom in chemical formula (3) is bonded to a Si atom in chemical formula (2), and
1 more element
Dependencies are inferred from the claim text.