Composition for crosslinking, and method for pattern formation, pattern film, and electronic device using the same
AssigneesUnist (Ulsan National Institute of Science and Technology), UIF (University Industry Foundation), Yonsei University
InventorsBongSoo KIM, Hyobin HAM, Jeong Ho CHO, In Cheol KWAK
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Abstract
Provided are a crosslinking composition, and a pattern formation method, a pattern film, and an electronic device each using the same.
Claims20
A crosslinking composition comprising:
- a crosslinking compound comprising a diazo group;
- and
- an organic semiconductor material, a polymer material, a metal material, an insulating material, or any combination thereof.
A pattern formation method comprising:
- forming a lower film by applying a crosslinking composition onto a substrate;
- and
- patterning the lower film,
- wherein the crosslinking composition comprises:
- a crosslinking compound comprising a diazo group;
- and
- an organic semiconductor material, a polymer material, a metal material, an insulating material, or any combination thereof.
A pattern film formed by using a crosslinking composition, the pattern film comprising:
- a crosslinking compound comprising a diazo group, and
- an organic semiconductor material, a polymer material, a metal material, an insulating material, or any combination thereof.
An electronic device including a pattern formed by using a crosslinking composition, the electronic device comprising:
- a crosslinking compound comprising a diazo group;
- and
- an organic semiconductor material, a polymer material, a metal material, an insulating material, or any combination thereof.
A color filter including a pattern formed by using a crosslinking composition, the color filter comprising:
- a crosslinking compound comprising a diazo group;
- and
- an organic semiconductor material, a polymer material, a metal material, an insulating material, or any combination thereof.
Dependencies are inferred from the claim text.