Optical apparatus for three-dimensional nanostructure measurement and inspection, three-dimensional nanostructure measurement and inspection apparatus including the same, and three-dimensional nanostructure measurement and inspection method

A three-dimensional nanostructure measurement and inspection apparatus comprising:

• an illumination system configured to emit illumination light to a measurement object;
• a photodetector configured to detect light from the measurement object;
• based on the measurement object comprising a three-dimensional nanostructure and a substrate, and the substrate comprising a first surface on which the three-dimensional nanostructure is mounted and a second surface that opposes the first surface, a meta deflector is configured to be provided on the second surface of the substrate;
• and
• a processor configured to control operations of the illumination system and the photodetector and analyze the three-dimensional nanostructure based on an output of the photodetector,
• wherein the illumination system is configured to emit the illumination light to be obliquely incident on the meta deflector, and
• the meta deflector is configured to negatively deflect the illumination light.

A method for a measurement object comprising a substrate, the substrate comprising a first surface on which a three-dimensional nanostructure is mounted and a second surface opposing the first surface, the method comprising:

• arranging a meta deflector on the second surface of the substrate;
• emitting illumination light to be obliquely incident on the meta deflector;
• negatively deflecting the illumination light by the meta deflector;
• coupling the negatively deflected illumination light to a leaky guided mode of the three-dimensional nanostructure;
• detecting light from the three-dimensional nanostructure by a photodetector;
• and
• analyzing the three-dimensional nanostructure based on an output of the photodetector.