Method for inspecting semiconductor device and system thereof
AssigneeTaiwan Semiconductor Manufacturing Company, Ltd.
InventorsYI-ZHEN CHEN, SHANG-CHIEH CHIEN, LI-JUI CHEN
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Abstract
An inspection system and inspection methods are provided. The inspection method includes steps of placing an specimen on a stage, wherein the stage comprises a plurality of first alignment marks; capturing a first image of the first alignment marks; determining a position drift between a current position of the stage and a reference position of the stage based on the first image; compensating for the position drift between the current position of the stage and the reference position of the stage; and performing an inspection operation on the specimen in response to the position drift being less than a first tolerance.
Claims20
An inspection method, comprising:
- placing an specimen on a stage, wherein the stage comprises a plurality of first alignment marks;
- capturing a first image of the first alignment marks;
- determining a position drift between a current position of the stage and a reference position of the stage based on the first image;
- compensating for the position drift between the current position of the stage and the reference position of the stage;
- and
- performing an inspection operation on the specimen in response to the position drift being less than a first tolerance.
An inspection method, comprising:
- placing a specimen on a stage, wherein the stage comprises a plurality of first alignment marks;
- capturing an image of the plurality of first alignment marks;
- determining whether the stage has a position drift based on the image;
- moving the stage in response to the stage having the position drift;
- and
- performing an inspection on the specimen in response to the position drift being less than a tolerance.
An inspection system, comprising:
- a stage having a plurality of alignment marks;
- a detector over the stage;
- an illumination source configured to generate a radiation;
- a processor coupled to the stage and the detector;
- and
- a lens assembly configured to direct the radiation from the illumination source to the stage and to direct radiation reflected by the plurality of alignment marks to the detector,
- wherein the processor is configured to determine whether the stage has a position drift based on an image of the plurality of alignment marks captured by the detector.
Dependencies are inferred from the claim text.