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US 2026/0209944 A1Published application
Multi-port gas injection system and reactor system including same
AssigneeASM IP Holding B.V.
InventorsMingyang Ma, Junwei Su, Alexandros Demos, Xing Lin, Sam Kim, Gregory Michael Bartlett
Life of this patent
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Abstract
A gas injection system, a reactor system including the gas injection system, and methods of using the gas injection system and reactor system are disclosed. The gas injection system can be used in gas-phase reactor systems to independently monitor and control gas flow rates in a plurality of channels of a gas injection system coupled to a reaction chamber.
Claims19
A gas injection system, comprising:
- a gas supply line;
- a gas manifold coupled to the gas supply line having a plurality of gas outlets;
- a plurality of mass flow sensors, wherein each of the plurality of mass flow sensors is coupled to a respective gas outlet;
- a plurality of gas valves, wherein each of the plurality of gas valves is coupled to an outlet of a respective mass flow sensor;
- and
- a controller electrically coupled to each of the plurality of mass flow sensors and each of the plurality of gas valves, the controller responsive to instructions recorded on a non-transitory machine-readable memory and configured to control a flow rate through each of the plurality of valves using closed-loop flow control, wherein controlling the flow rate through each of the plurality of valves comprises the controller:
- transmitting a respective setpoint for each of the plurality of gas valves, wherein each of the plurality of gas valves is configured to flow gas at an initial flow rate based on the respective setpoint,
- receiving a respective flow rate measurement for each of the plurality of gas valves,
- determining a respective measured flow ratio for each of the plurality of gas valves, wherein the respective measured flow ratio is the respective flow rate measurement divided by the sum of each flow rate measurement for each of the plurality of gas valves,
- determining a respective difference between the respective flow rate measurement and a respective setpoint for each of the plurality of gas valves, and
- controlling the flow rate for each of the plurality of gas valves based on the respective difference.
8 more elements
A gas injection system, comprising:
- a gas source;
- a gas supply line fluidly connected to the gas source;
- a plurality of gas channels fluidly connected to the gas supply line, wherein the gas supply line is configured to divide a total flow of a gas stream from the gas source into the plurality of gas channels;
- a plurality of mass flow controllers, wherein each mass flow controller is disposed on a respective gas channel and configured to measure and control a respective gas flow through the respective gas channel;
- and
- a main controller operatively connected to each of the plurality of mass flow controllers, wherein the main controller is configured to send a respective initial flow ratio setpoint to a respective mass flow controller for each of the plurality of mass flow controllers, and further configured to send a respective feedback flow ratio setpoint to the respective mass flow controller for each of the plurality of mass flow controllers based on a respective determined flow ratio based on measured gas flow through each of the plurality of mass flow controllers.
3 more elements
Dependencies are inferred from the claim text.