Method of manufacturing magnesium indium oxide thin films

Abstract

A method of manufacturing a MgInxOy film (where x>0 and y>0) includes performing one or more cycles of an atomic layer deposition process. Each of the one or more cycles includes performing a first process and a second process. The first process includes supplying a first precursor containing magnesium to a substrate, and supplying a first reactant to the substrate such that the first reactant reacts with the first precursor to form a first intermediate layer on the substrate. The second process includes supplying a second precursor containing indium to the substrate, and supplying a second reactant to the substrate such that the second reactant reacts with the second precursor to form a second intermediate layer on the substrate.

Dependencies are inferred from the claim text.