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US 2026/0209679 A1Published application
Chlorine dioxide concentration control system
AssigneeTaiko Pharmaceutical Co., Ltd.
InventorsKoushirou SOGAWA, Kouichi TAURA, Kazuhiko TAGUCHI, Kenkichi AOKI
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Abstract
The object of the present invention is to realize sanitary control at cell culture processing facilities with chlorine dioxide gas at a low concentration. An automatic chlorine dioxide concentration control system in a cell culture device, comprising a chlorine dioxide feeding device and a chlorine dioxide concentration measuring device is provided.
Claims15
An automatic chlorine dioxide concentration control system in a cell culture device, wherein
- said system comprises:
- (i) a chlorine dioxide feeding device comprising a first automatic controlling valve, and
- (ii) a chlorine dioxide concentration measuring device comprising a chlorine dioxide concentration measuring sensor;
- said chlorine dioxide feeding device and said chlorine dioxide concentration measuring device are each connected to be in fluid connection with said cell culture device;
- and
- when the chlorine dioxide concentration in said cell culture device measured by said chlorine dioxide concentration measuring device falls under predetermined first value, said first automatic controlling valve is opened to feed chlorine dioxide gas from said chlorine dioxide feeding device into said cell culture device, and when the chlorine dioxide concentration in said cell culture device measured by said chlorine dioxide concentration measuring device exceeds a predetermined second value, said first automatic controlling valve is closed to stop the feeding of chlorine dioxide gas from said chlorine dioxide feeding device into said cell culture device, thereby maintaining the chlorine dioxide concentration in said cell culture device to generally within the range of said first value and said second value.
3 more elements
Dependencies are inferred from the claim text.