Cerium oxide-based polishing powder and preparation method, polishing solution and use thereof

Abstract

A cerium oxide-based polishing powder includes porous secondary particles assembled from a plurality of primary grains. The primary grains have a pore diameter of 2 to 30 nm, a pore volume of 0.10 to 0.50 cm3/g, a specific surface area of 10 to 80 m2/g, and the content of trivalent cerium at the surface accounts for 10% to 40% of the total content of cerium at the surface, and a preparation method, a polishing solution and a use thereof. The microstructure of the cerium oxide-based polishing powder is porous cerium oxide-based particles assembled from nano primary particles, and the self-assembled structure enables the cerium oxide-based particles to have a higher surface trivalent cerium content and a higher specific surface area at the same time, which is beneficial to obtaining a higher polishing rate; the sub-micron particle size improves its dispersibility in the polishing slurry.

Dependencies are inferred from the claim text.