Hydrogen peroxide plasma surface modification

Abstract

The techniques described herein relate to hydrogen peroxide plasma surface modification. In some aspects, a method includes providing a liquid mixture including hydrogen peroxide to a source. The source can include a membrane that is permeable to the hydrogen peroxide, or a wick material that adsorbs the liquid mixture, where the membrane or the wick material separates the liquid mixture from a head space of the source. The head space includes a vapor mixture including hydrogen peroxide vapor, which can be provided from the head space of the source, wherein a concentration of the hydrogen peroxide vapor in the vapor mixture is substantially stable over time. A hydrogen peroxide plasma can be formed from the vapor mixture, and a material can be exposed to the hydrogen peroxide plasma in a chamber.

Dependencies are inferred from the claim text.