Molybdenum compound, method for preparing same, and composition comprising same for thin film deposition
AssigneeDnf Co., Ltd.
InventorsYonghee KWONE, Youngjae IM, Sangyong JEON, Taeseok BYUN, Sangchan LEE, Sangick LEE
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Abstract
The present invention relates to a molybdenum compound, a method for preparing same, a composition comprising same for depositing a molybdenum film-containing thin film, and a method for manufacturing a molybdenum-containing thin film by using same. The employment of the molybdenum compound of the present invention having excellent thermal stability, high volatility, and improved vapor pressure can manufacture a molybdenum-containing thin film with a uniform thickness at an improved deposition rate.
Claims12
A molybdenum compound represented by the following Chemical Formula 1:
- in Chemical Formula 1,
- L is C1-C10 alkylene or halo C1-C10 alkylene;
- R1 to R10 are each independently hydrogen or C1-C10 alkyl;
- Y is —NR11R12, —OR13, or —SR14;
- and
- R11 to R14 are each independently hydrogen, C1-C10 alkyl, or halo C1-C10 alkyl, or R11 and R12 may be linked to each other to form a ring.
A preparation method of a molybdenum compound comprising preparing a molybdenum compound represented by the following Chemical Formula 1-1 by reacting a hydrogen source or alkyllithium, a compound of the following Chemical Formula 4, and a compound of the following Chemical Formula 5:
- MoX5
- in Chemical Formulas 1-1, 4, and 5,
- L is C1-C10 alkylene or halo C1-C10 alkylene;
- R1 to R6 are each independently hydrogen or C1-C10 alkyl;
- Y is —NR11R12, —OR13, or —SR14;
- R11 to R14 are each independently hydrogen, C1-C10 alkyl, or halo C1-C10 alkyl, or R11 and R12 may be linked to each other to form a ring;
- and
- X is halogen.
A molybdenum-containing thin film comprising 35% or more of molybdenum and 40% or more of nitrogen.
Dependencies are inferred from the claim text.