Cleaning brush, substrate cleaning apparatus including same, and method for manufacturing same

A substrate cleaning apparatus comprising:

• a cleaning liquid spray configured to supply a cleaning liquid onto a wafer;
• a cleaning brush configured to clean one surface of the wafer;
• a brush actuator configured to rotate the cleaning brush;
• and
• a cleaning liquid supply configured to supply the cleaning liquid to the cleaning brush,
• wherein the cleaning brush comprises:
• a core comprising:
• a hollow portion formed in a first direction parallel to a central axis,
• an injection line extending in the first direction around the hollow portion,
• a plurality of nodule-forming portions formed on an outer circumferential surface of the core, and
• an inflow portion connecting the injection line and the plurality of nodule-forming portions in a radial direction intersecting the first direction;
• a plurality of nodules extending through the outer circumferential surface of the core via the plurality of nodule-forming portions;
• and
• a filler connected to the plurality of nodules and filled in the injection line and the inflow portion.

A method of manufacturing a cleaning brush, comprising:

• forming a hollow portion in a core;
• forming a plurality of nodule-forming portions on an outer circumferential surface of the core;
• forming an injection line around the hollow portion;
• forming an inflow portion connecting the injection line and the plurality of nodule-forming portions;
• providing a mold having a plurality of cavities corresponding to the plurality of nodule-forming portions on the outer circumferential surface of the core;
• and
• injecting a filler material through the injection line.