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US 2026/0206557 A1Published application
Feature fill using inhibition
AssigneeLam Research Corporation
InventorsAnand CHANDRASHEKAR, Son Vo Nam TRAN
Life of this patent
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Abstract
Provided herein are methods of filling features with metal including inhibition of metal nucleation
Claims20
A method comprising:
- a) providing a feature to be filled with metal, the feature including a feature opening and sidewalls extending from the feature opening to a process station;
- and
- b) exposing the feature to a metal precursor, a reducing agent, and a nitrogen-containing gas to fill the feature with metal, wherein the nitrogen-containing gas inhibits metal deposition on surfaces of the sidewalls it contacts.
An apparatus comprising:
- a process station comprising a showerhead to direct gases to a substrate support;
- a controller configured to execute machine-readable instructions for filling a feature with metal, the instructions comprising instructions for:
- (a) causing flowing of a metal precursor, a reducing agent, and a nitrogen-containing gas into the process station to fill the feature with metal.
Dependencies are inferred from the claim text.