Semiconductor device
AssigneeVanguard International Semiconductor Corporation
InventorsChen-Dong Tzou, Yun-Kai Lai, Chih-Cherng Liao, Chia-Hao Lee
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AssigneeVanguard International Semiconductor Corporation
InventorsChen-Dong Tzou, Yun-Kai Lai, Chih-Cherng Liao, Chia-Hao Lee
Estimating the term…
A semiconductor device includes vertical and lateral transistors respectively disposed in first and second areas of a substrate having a first conductivity type. The vertical transistor includes a first buried layer and a first well region both having a second conductivity type, a first trench, and a second trench. The first buried layer is embedded in the substrate. The first well region is disposed directly above the first buried layer. The first trench extends downward from the first well region into the first buried layer. A conductive portion is disposed in the first trench, in direct contact with the first buried layer, and electrically connected to a drain contact. The second trench is disposed in the first well region. A gate electrode is disposed in the second trench. A source region abuts the second trench.
A semiconductor device, comprising:
Dependencies are inferred from the claim text.