Semiconductor device and method of manufacturing semiconductor device

Abstract

A semiconductor device includes first row lines extending in a first direction, common column lines located on the first row lines and extending in a second direction that crosses the first direction, second row lines located on the common column lines and extending in the first direction, first memory cells located between the first row lines and the common column lines, respectively, second memory cells located between the common column lines and the second row lines, respectively, second liner patterns each covering at least a sidewall of each of the first memory cells neighboring in the first direction, and third liner patterns each covering at least a sidewall of each of the second memory cells neighboring in the first direction and extending over a corresponding one of the second liner patterns.

Dependencies are inferred from the claim text.