US 2026/0201562 A1 · REACTOR FOR MPCVD APPARATUS

Abstract

A reactor for an MPCVD apparatus comprises a casing and a stage. The casing comprises an inner bottom surface, an inner top surface, and an inner annular wall surface. The inner top surface and the inner bottom surface are spaced apart from and face towards each other. The inner top surface protrudes towards the inner bottom surface. Two ends of the inner annular wall surface are connected to the inner top surface and the inner bottom surface respectively, thereby forming a reacting cavity among the inner bottom surface, the inner top surface, and the inner annular wall surface. A microwave field formed from a microwave would be in the reacting cavity. The stage is disposed in the reacting cavity and has a carrying surface, and the carrying surface faces towards the inner top surface. The reactor would prevent the generated plasma from being unstable to reduce affection on the MPCVD reaction.

Claims18

Dependent claims

A reactor for a microwave plasma assisted chemical vapor deposition (MPCVD) apparatus configured to form a microwave field with a microwave, and the reactor for the MPCVD apparatus comprising:

a casing having:
an inner bottom surface and an inner top surface being round and spaced apart from and facing towards each other, a diameter of the inner bottom surface being greater than a diameter of the inner top surface, and the inner top surface protruding towards the inner bottom surface;
and
an inner annular wall surface, and two ends of the inner annular wall surface connected to the inner top surface and the inner bottom surface respectively, thereby forming a reacting cavity among the inner bottom surface, the inner top surface, and the inner annular wall surface, and the microwave field located in the reacting cavity;
and
a stage disposed in the reacting cavity and having a carrying surface, and the carrying surface facing towards the inner top surface.

3 more elements

Dependencies are inferred from the claim text.

Reactor for mpcvd apparatus

Life of this patent

Reactor for mpcvd apparatus

Life of this patent

Abstract

Claims18