Polarizer Stencil Mask
AssigneeUniversity of Copenhagen
InventorsMichaela Eichinger, Thomas Kanne Nordqvist, Tobias Skov Særkjær, Morten Kjærgaard, Peter Krogstrup Jeppesen
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Abstract
The present disclosure relates to a stencil mask for defining a plurality of patterns on a substrate during evaporation of material from an evaporation source, the stencil mask comprising a membrane having a top surface and bottom surface and a thickness therebetween of at least 200 nm defining the thickness of the membrane, and a at least one set of parallel slits extending through the thickness of the membrane, wherein the slits are defined such that the material coming from an evaporation source is blocked by the mask or deposited onto the substrate depending on the alignment of said source with the stencil mask.
Claims30
1-21. (canceled)
A stencil mask for defining a plurality of patterns on a substrate during evaporation of material from an evaporation source, the stencil mask comprising,
- a) a membrane having a top surface and bottom surface and a thickness therebetween of at least 200 nm defining the thickness of the membrane, and
- b) at least one set of parallel slits extending through the thickness of the membrane, wherein the width of parallel slits is at least 10 nm.
A method for defining a plurality of patterns on a substrate by evaporation from one or more evaporation sources using different evaporation materials, the method comprising the steps of
- c) providing a substrate,
- d) providing at least one evaporation source located above the substrate,
- e) providing a stencil mask substantially parallel to the substrate, located between the substrate and the at least one evaporation source, said mask comprising a plurality of sets of parallel slits,
- f) rotating the stencil mask to an in-plane azimuth angle around an axis perpendicular to the surface substrate of the stencil mask,
- g) rotating the stencil mask to an elevation angle defined as the smallest angle between the substrate and the at least one evaporation source, and
- h) evaporating one or more materials over the mask.
Dependencies are inferred from the claim text.