Substrate cleaning composition, and using the same, method for manufacturing cleaned substrate and method for manufacturing device
AssigneeMerck Patent GmbH
InventorsTakafumi Kinuta, Tatsuro Nagahara
Life of this patent
Estimating the term…
Abstract
To obtain a substrate cleaning composition capable of cleaning a substrate and removing particles. [Means for Solution] To provide a substrate cleaning composition comprising an insoluble or hardly soluble solute (A), wherein the insoluble or hardly soluble solute (A) is a monomer of (A-1) and/or a multimer of (A-1); the pKa of the insoluble or hardly soluble solute (A) is 9.5 to 4, the pKb of the insoluble or hardly soluble solute (A) is 9.5 to 4, and/or (A-1) comprises 2 to 4 polar groups; and the polar group is at least one selected from the group consisting of −OH, —COOH, —NO2, —NH2 and —NH—.
Claims17
A substrate cleaning composition comprising an insoluble or hardly soluble solute (A):
- wherein
- the insoluble or hardly soluble solute (A) is a monomer of (A-1) and/or a multimer of (A-1);
- the pKa of the insoluble or hardly soluble solute (A) is 9.5 to 4, the pKb of the insoluble or hardly soluble solute (A) is 9.5 to 4, and/or (A-1) comprises 2 to 4 polar groups;
- and
- the polar group is at least one selected from the group consisting of —OH, —COOH, —NO2, —NH2 and —NH—:
- optionally, the substrate cleaning composition comprises a solvent (C);
- optionally, the substrate cleaning composition is applied on a substrate and dried to remove at least a part of the solvent (C) to form a film, the film being then removed from the substrate by a remover;
- optionally, the substrate cleaning composition is applied on a substrate and heated to form a film, the film being then removed from the substrate by the remover;
- and/or
- optionally, the insoluble or hardly soluble solute (A) is insoluble or hardly soluble by the remover.
Dependencies are inferred from the claim text.