Novel alkoxyaminosilylamine compound, method for preparing the same, composition for depositing silicon-containing thin film including the same, and method for manufacturing silicon-containing thin film using the same

A method for preparing an alkoxyaminosilylamine compound, the method comprising:

• reacting a compound of the following Chemical Formula 3 and a compound of the following Chemical Formula 4 in the presence of C1-C5 alkyllithium to prepare an alkoxyaminosilylamine compound of the following Chemical Formula 1:
• wherein R1 to R4 are independently of one another hydrogen, C1-C10 alkyl, C2-C10 alkenyl, or halogen;
• wherein R5 to R8 are independently of one another C1-C10 alkyl;
• and
• wherein X is a halogen.

A method for preparing an alkoxyaminosilylamine compound, the method comprising:

• reacting a compound of the following Chemical Formula 4 and a compound of the following Chemical Formula 5 in the presence of C1-C5 alkyllithium to prepare a compound of the following Chemical Formula 6;
• and adding a reducing agent to the compound of Chemical Formula 6 to prepare an alkoxyaminosilylamine compound of the following Chemical Formula 1-1:
• wherein R1, R3, and R4 are independently of one another hydrogen, C1-C10 alkyl, C2-C10 alkenyl, or halogen;
• wherein R5 to R8 are independently of one another C1-C10 alkyl;
• and
• wherein X is a halogen.