Integrated circuit including segmented patterns and method for designing the same

A method for designing an integrated circuit, the method comprising:

• disposing a first pattern extending along a first direction in a first wiring layer;
• estimating a current flowing through the first pattern;
• determining whether electromigration exceeds a critical value based on the first pattern and the current;
• and
• segmenting the first pattern based on determining the electromigration exceeds the critical value,
• wherein the segmenting of the first pattern comprises:
• identifying a first maximum length at which an electromigration short length effect occurs in the first wiring layer;
• and
• generating, from the first pattern, a first segment having a length less than or equal to the first maximum length.

A method for designing an integrated circuit, the method comprising:

• obtaining reference data corresponding to a first wiring layer of the integrated circuit;
• collecting a maximum value of a current flowing in a pattern of the first wiring layer based on the reference data;
• and
• disposing, based on the reference data and the maximum value, a plurality of first patterns individually having lengths less than or equal to a first maximum length at which an electromigration short length effect occurs.