Plasma reactor for gas reforming, gas reforming apparatus using the same, and method using the plasma reactor

A gas reforming apparatus for converting processing target gas into reformed gas, the gas reforming apparatus comprising:

• a gas supply unit, which supplies the processing target gas, plasma driving gas, and auxiliary gas for preventing a reverse reaction of the reformed gas;
• a plasma reactor, which receives the processing target gas, the plasma driving gas, and the auxiliary gas and converts the processing target gas into the reformed gas by using plasma generated by arc discharging;
• and
• a gas storage, which receives the reformed gas discharged from the plasma reactor,
• wherein the plasma reactor comprises:
• a housing having a reaction space therein, at least one gas inlet connected to the gas supply unit, and a gas outlet through which the reformed gas is discharged,
• a ground electrode arranged in the reaction space and forming an inner wall of the reaction space, and
• a high-voltage electrode arranged inside the reaction space to face the ground electrode and which generates the arc discharging,
• the high-voltage electrode has a cone shape including an enlargement portion, a reduction portion, and a boundary portion between the enlargement portion and the reduction portion,
• the reaction space includes a gas supply region between the enlargement portion and the inner wall, a discharging region which is a region between the reduction portion and the inner wall and in which the arc discharging occurs, and a connection region which is a region between the boundary portion and the inner wall and connects the gas supply region to the discharging region, and
• the at least one gas inlet is connected to the gas supply region.