Substrate processing apparatus and substrate processing system
AssigneeTokyo Electron Limited
InventorNobuyuki NAGAYAMA
Life of this patent
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Abstract
A substrate processing apparatus to process a substrate, the substrate processing apparatus including: a processing chamber; and a support member disposed in the processing chamber and having a tray supporting surface for supporting a tray on an upper surface of the support member, in which the tray includes a recess accommodating the substrate on an upper surface of the tray via a first heat transfer material, and the tray supporting surface includes a second heat transfer material is interposed between the tray supporting surface and a lower surface side of the tray.
Claims20
A substrate processing apparatus configured to process a substrate, the substrate processing apparatus comprising:
- a processing chamber;
- and
- a support member disposed in the processing chamber and having a tray supporting surface for supporting a tray on an upper surface of the support member,
- wherein the tray includes a recess accommodating the substrate on an upper surface of the tray via a first heat transfer material, and
- the tray supporting surface includes a second heat transfer material interposed between the tray supporting surface and a lower surface side of the tray.
A substrate processing apparatus configured to process a substrate, the substrate processing apparatus comprising:
- a processing chamber;
- a support member disposed in the processing chamber and having a tray supporting surface on an upper surface;
- and
- a tray including:
- a recess accommodating the substrate on an upper surface,
- a first heat transfer material disposed in the recess and interposed between the substrate and the tray, and
- a second heat transfer material disposed on a lower surface side of the tray and interposed between the tray supporting surface and the tray.
A substrate processing system configured to process a substrate, the substrate processing system comprising:
- a tray including an upper surface having a recess for accommodating a substrate;
- a mounting apparatus configured to mount the substrate on the tray;
- a transporter configured to hold and transport the tray on which the substrate is mounted;
- a processing module including a processing chamber and configured to perform desired processing on the substrate;
- and
- a separation apparatus configured to separate the substrate from the tray.
Dependencies are inferred from the claim text.