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US 2026/0190943 A1Published application
Wafer-processing sheet and method for manufacturing a semiconductor device
AssigneeDisco Corporation
InventorsMasamitsu Kimura, Koshiro Suzuki, Norihisa Arifuku
Life of this patent
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Abstract
A wafer-processing sheet includes a water-soluble resin layer formed of a water-soluble resin, and a base layer formed of a resin sheet covering one side of the water-soluble resin layer and having tackiness on a surface thereof on a side toward the water-soluble resin layer under a predetermined condition.
Claims10
A wafer-processing sheet comprising:
- a water-soluble resin layer formed of a water-soluble resin, and
- a base layer formed of a resin sheet covering one side of the water-soluble resin layer and having tackiness on a surface thereof on a side toward the water-soluble resin layer under a predetermined condition.
A method for manufacturing a semiconductor device, comprising:
- fixing a wafer-processing sheet, the wafer-processing sheet including a water-soluble resin layer formed of a water-soluble resin and a base layer formed of a resin sheet covering one side of the water-soluble resin layer and having tackiness on a surface thereof on a side toward the water-soluble resin layer under a predetermined condition, to a wafer in a plate shape, the wafer including a device region in which devices are formed and an outer peripheral excess region surrounding the device region, in an orientation such that a side of the wafer-processing sheet having the water-soluble resin layer faces the wafer;
- processing the wafer while supplying a liquid including water to the wafer;
- after the processing, separating at least the base layer of the wafer-processing sheet from the wafer;
- and
- after the separating, washing a surface of the wafer, onto which the wafer-processing sheet had been fixed, with a liquid including water.
2 more elements
Dependencies are inferred from the claim text.