Apparatus for processing substrate

An apparatus for processing a substrate, comprising:

• a first heat treatment chamber and a second heat treatment chamber for heat-treating a substrate;
• a first cooling chamber and a second cooling chamber for cooling the substrate;
• a liquid treatment chamber for liquid-treating the substrate;
• and
• a transfer robot for transferring the substrate,
• wherein the first cooling chamber and the second cooling chamber, and the first heat treatment chamber and the second heat treatment chamber are disposed in a first line in the order of the first cooling chamber, the first heat treatment chamber, the second cooling chamber, and the second heat treatment chamber,
• the liquid treatment chamber is disposed in a second line, opposite to the first line, and
• the transfer robot is movably installed between the first line and the second line.

In an apparatus for processing a substrate including a plurality of substrate processing blocks stacked on each other in a vertical direction,

• wherein each of the plurality of substrate processing blocks comprises:
• a plurality of heat treatment chambers for heat-treating a substrate;
• a first cooling chamber and a second cooling chamber for cooling the substrate;
• a liquid treatment chamber for liquid-treating the substrate;
• and
• a transfer robot for transferring the substrate,
• wherein the plurality of heat treatment chambers, the first cooling chamber, and the second cooling chamber are disposed in a line,
• the first cooling chamber is disposed on one side of the plurality of heat treatment chambers, and
• the second cooling chamber is disposed between the plurality of heat treatment chambers.