Method for objective hologram quality assessment

Abstract

There is provided a hologram quality assessment method. The quality assessment method according to an embodiment may receive an input of an original holographic fringe pattern and a target holographic fringe pattern which is a comparison target, may calculate angular spectra of the inputted original holographic fringe pattern and target holographic fringe pattern, respectively, and may calculate a PSNR as a quality value of the target holographic fringe pattern from the calculated angular spectra. Since the angular spectrum of the holographic fringe pattern has the same characteristic without a change according to a distance, not only a diffraction wavefront that is positioned at a position of the holographic fringe pattern but also a diffraction wavefront positioned at a certain distance may have the same PSNR value. Accordingly, objective quality assessment for a holographic fringe pattern is possible.

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