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US 2026/0186459 A1Published application
Apparatus and method for processing substrate
AssigneeSemes Co., Ltd.
InventorsSeung Un OH, Myung Chan CHO
Life of this patent
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Abstract
A substrate processing apparatus includes an index unit configured to unload a substrate from a container storing the substrate; and a control unit configured to control the index unit. The index unit is configured to unload the substrate from the container at a predetermined time interval, and to close a door of the container after unloading the substrate.
Claims20
A substrate processing apparatus comprising:
- an index unit configured to unload a substrate from a container storing the substrate;
- and
- a control unit configured to control the index unit,
- wherein the index unit is configured to unload the substrate from the container at a predetermined time interval, and to close a door of the container after unloading the substrate.
1 more element
A substrate processing method comprising:
- determining a predetermined time interval;
- unloading a substrate from a container storing the substrate at the predetermined time interval;
- and
- closing a door of the container after unloading the substrate.
1 more element
A substrate processing apparatus comprising:
- a processor;
- and
- a memory storing an instruction executed by the processor,
- wherein, when the processor executes the instruction stored in the memory, the processor is configured to:
- unload a substrate from a container storing the substrate at a predetermined time interval, and
- close a door of the container such that a substrate remaining in the container is not in contact with the outside of the container, after unloading the substrate.
3 more elements
Dependencies are inferred from the claim text.