Imprint method

An imprint method, including:

• providing a first master mold including a first protruding pattern and a second protruding pattern, wherein a width of the first protruding pattern is less than a width of the second protruding pattern;
• providing a second master mold including a third protruding pattern, wherein a width of the third protruding pattern is less than the width of the first protruding pattern;
• performing a first imprint step on a first photoresist layer formed on a replica mold by using the first master mold;
• performing a first etching step on the replica mold by using the remaining first photoresist layer, so as to form a first recessed portion and a second recessed portion;
• performing a second imprint step on a second photoresist layer formed on the replica mold by using the second master mold;
• performing a second etching step on the replica mold by using the remaining second photoresist layer, so as to form a third recessed portion, wherein the third recessed portion overlaps the first recessed portion;
• performing a third imprint step on a third photoresist layer formed on a substrate by using the replica mold;
• and
• performing a third etching step on the substrate by using the remaining third photoresist layer, so as to form a desired pattern.