Apparatus and method for growing high-quality silicon carbide crystals and silicon carbide crystals
AssigneeTongwei Microelectronics Co., Ltd.
InventorsYuyi Lin, Xi Liu, Chunlin Feng, Hongli Xu
Life of this patent
Estimating the term…
Loading patent…
AssigneeTongwei Microelectronics Co., Ltd.
InventorsYuyi Lin, Xi Liu, Chunlin Feng, Hongli Xu
Estimating the term…
The present disclosure provides an apparatus and method for growing high-quality silicon carbide crystals and silicon carbide crystals, and relates to the technical field of the silicon carbide crystals. In the apparatus, a pressure equalizing structure is arranged on the annular guide plate, a pressure difference between a second chamber above the annular guide plate and a first chamber below the annular guide plate can be effectively reduced, and the flow rate of the gaseous-phase crystal growth components at a gap between a top end of the annular guide plate and an edge of the seed crystal can be effectively reduced accordingly, and then the defects such as a “concave interface” on the silicon carbide crystals growing on the seed crystal are avoided, thereby improving the growth quality of the silicon carbide crystals. The silicon carbide crystals prepared by the method have characteristics of fewer defects and high quality.
An apparatus for growing high-quality silicon carbide crystals,
Dependencies are inferred from the claim text.