Etching method and etched article
AssigneeBraun GmbH
InventorsMercedes Runge, Blerim Ahmeti, Christian Heinz Ohle
Life of this patent
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Abstract
Provided is an etching method that includes providing a metallic substrate on which an etch-resistant material is arranged to mask the metallic substrate, through which etch-resistant material apertures are defined. The etch-resistant material comprises a continuous region that extends continuously between and surrounds the apertures. The etching method includes etching the metallic substrate, with the etching including delivering an etchant to the metallic substrate through the apertures so that discrete recessed regions in the metallic substrate are initially etched beneath the apertures.
Claims14
An etching method for manufacturing a foil, comb or blade for an electric shaver comprising:
- providing a metallic substrate on which an etch-resistant material is arranged to mask the metallic substrate, through which etch-resistant material apertures are defined, wherein each of the apertures has a diameter, or if not circular a largest dimension across the respective aperture, in the range of 5 μm to 5 mm, wherein the etch-resistant material comprises a continuous region that extends continuously between and surrounds the apertures;
- and
- etching the metallic substrate, the etching comprising delivering an etchant to the metallic substrate through the apertures so that discrete recessed regions in the metallic substrate are etched beneath the apertures, the etch-resistant material being resistant to the etchant, wherein the etching is continued until at least some of the discrete recessed regions merge beneath the continuous region of the etch-resistant material to form one or more merged etched regions with a portion of the metallic substrate still remaining beneath the one or more merged etched regions following the etching.
Dependencies are inferred from the claim text.