Substrate processing apparatus
AssigneeTes Co., Ltd
InventorsKyung-Ho JANG, Min-Wook KANG, Byeong-Ho YUN
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Abstract
A substrate processing apparatus includes a chamber, an upper showerhead plate, and a substrate supporting unit. The chamber provides a processing space for a substrate. The upper showerhead is provided in an upper region of an interior of the chamber to supply purge gas toward an upper surface of the substrate. The substrate supporting unit is provided in a lower region of the interior of the chamber to support a periphery of a lower surface of the substrate. The substrate supporting unit includes a metal lower showerhead assembly that supplies at least one of process gas and cleaning gas toward the lower surface of the substrate.
Claims11
A substrate processing apparatus comprising:
- a chamber configured to provide a processing space for a substrate;
- an upper showerhead provided in an upper region of an interior of the chamber and configured to supply purge gas toward an upper surface of the substrate;
- and
- a substrate supporting unit provided in a lower region of the interior of the chamber and configure to support a periphery of a lower surface of the substrate, the substrate supporting unit including a metal lower showerhead assembly configured to supply at least one of process gas and cleaning gas toward the lower surface of the substrate.
Dependencies are inferred from the claim text.