Back to results
US 2026/0185227 A1Published application
Method for manufacturing thin film
AssigneeDaikin Industries, Ltd.
InventorsAkiyoshi YAMAUCHI, Yosuke KISHIKAWA, Shigehito SAGISAKA, Hisataka HAYASHI, Shingo NAKAMURA, Kazunori HORIGUCHI, Yukihiro SHIMOGAKI, Jun YAMAGUCHI, Takeshi MOMOSE, Noboru SATO
Life of this patent
Estimating the term…
Abstract
A method for manufacturing a thin film, which includes a deposition process for depositing a raw material compound on a substrate material by atomic layer deposition using the raw material compound; and a film forming process for forming a thin film by reducing a deposited product with a reducing gas at a pressure of 4.5 Torr or more after the deposition process.
Claims16
A method for manufacturing a thin film, comprising:
- a deposition process for depositing a raw material compound on a substrate material by atomic layer deposition using the raw material compound;
- and a film forming process for forming a thin film by reducing a deposited product with a reducing gas at a pressure of 4.5 Torr or more after the deposition process.
Dependencies are inferred from the claim text.