Mems device and preparation therefor

Abstract

The present application provides a MEMS device and a preparation method therefor. The MEMS device includes a piezoelectric diaphragm, a blocking layer disposed on a side of the piezoelectric diaphragm, a sacrificial layer connected to a side of the blocking layer back away from the piezoelectric diaphragm, and a substrate connected to a side of the sacrificial layer back away from the blocking layer. The substrate includes a wall connected to a side of the sacrificial layer back away from the blocking layer and forming a cavity, and a mass block disposed on the side of the sacrificial layer back away from the blocking layer and accommodated within the cavity, which is formed by etching the substrate and is spaced apart from the wall. The mass block can drive the piezoelectric diaphragm to produce significant mechanical deformation, improving the sensitivity and response efficiency of the MEMS device.

Dependencies are inferred from the claim text.