Cleaning apparatus, treatment apparatus and method for respectively cleaning and treating pot-shaped hollow bodies, in particular transporting containers for semiconductor wafers or for lithography masks

A device for cleaning pot-shaped hollow bodies, semiconductor wafers and/or lithography masks, comprising:

• at least one side wall that bounds a cleaning space, wherein the side wall forms at least one device opening by which a hollow body is introduced into the cleaning space by a gripping and moving device, wherein the hollow body has a hollow body wall that forms a hollow body opening that is closed by a cover and forms an outer hollow body surface;
• and
• at least one supply device for supplying a cleaning fluid to the outer hollow body surface of the hollow body closed by the cover, wherein the device opening is configured such that the gripping and moving device projects at least partially into the cleaning space or terminates flush with the device opening at least during the supply of the cleaning fluid.

The treatment device of 32, wherein a particle measuring device is arranged in the drainage channel for determining the number of the particles in the drained cleaning fluid, in the drained first cleaning fluid, and/or in the drained second cleaning fluid.

A method for cleaning pot-shaped hollow bodies and/or transport containers for semiconductor wafers or for lithography masks, said method comprising:

• introducing a hollow body into a cleaning space by a gripping and moving device, wherein the hollow body has a hollow body wall that forms a hollow body opening that is closed by a cover and forms an outer hollow body surface;
• and
• supplying a cleaning fluid to the outer hollow body surface of the hollow body closed by the cover by a supply device, wherein the hollow body is connected to the gripping and moving device during the supply of the cleaning fluid and held by the gripping and moving device in the cleaning space.