Substrate cleaning device, substrate processing apparatus, method, and storage medium
AssigneeEbara Corporation
InventorsMEGUMI UNO, CHIKAKO TAKATOH
Life of this patent
Estimating the term…
Abstract
A substrate cleaning device includes: a cleaning member, which is a cleaning member that cleans a polished substrate and moves between a cleaning position of cleaning the substrate and a retract position of cleaning the cleaning member; and a measurement part irradiating, at the retract position, the cleaning member with light and receiving scattered light or reflected light from the cleaning member, thereby measuring a residual amount of abrasive particles remaining on the cleaning member.
Claims7
A substrate cleaning device, comprising:
- a cleaning member, which is a cleaning member that cleans a polished substrate and moves between a cleaning position of cleaning the substrate and a retract position of cleaning the cleaning member;
- and
- a measurement part, irradiating, at the retract position, the cleaning member with light and receiving scattered light or reflected light from the cleaning member, thereby measuring a residual amount of abrasive particles remaining on the cleaning member.
A method for measuring a residual amount of abrasive particles remaining on a cleaning member that cleans a polished substrate, the method comprising:
- moving the cleaning member from a cleaning position of cleaning the substrate to a retract position of cleaning the cleaning member;
- and
- measuring, at the retract position, the residual amount of the abrasive particles remaining on the cleaning member by irradiating the cleaning member with light and receiving scattered light or reflected light from the cleaning member.
A computer-readable storage medium, storing a program which, causes a computer to execute a method for measuring a residual amount of abrasive particles remaining on a cleaning member that cleans a polished substrate, the method comprising:
- moving the cleaning member from a cleaning position of cleaning the substrate to a retract position of cleaning the cleaning member;
- and
- measuring, at the retract position, the residual amount of the abrasive particles remaining on the cleaning member by irradiating the cleaning member with light and receiving scattered light or reflected light from the cleaning member.
Dependencies are inferred from the claim text.