High presssure substrate processing apparatus and gaseous hydrogen oxide generating module

Abstract

Disclosed are a high pressure substrate processing apparatus and a gaseous hydrogen oxide generating module. The apparatus includes an internal chamber, a generating module, and a control module. The internal chamber includes a processing area accommodating a processing gas including gaseous hydrogen oxide and having a processing pressure higher than atmospheric pressure and accommodating a substrate to be processed using the processing gas. The generating module includes a generating chamber and a heating unit. The generating chamber is made of a soluble material and includes a generating area accommodating a raw fluid while communicating with the processing area. The heating unit is configured to heat the raw fluid accommodated in the generating area to generate the gaseous hydrogen oxide. The control module is configured to control the operation of the heating unit to provide the generating area with an amount of heat that generates the gaseous hydrogen oxide without generating liquid hydrogen oxide from the raw fluid.

Dependencies are inferred from the claim text.