Cleaning system for cleaning an optical element of a charged particle evaluation system

Abstract

A cleaning system for cleaning an optical element of a vacuumed space of the charged particle evaluation system of a charged particle evaluation system, the cleaning system includes (a) an ozone supply system configured to provide a cleaning-related flow of ozone to the vacuumed space during a cleaning session; and (b) a laser beam optics configured to (i) generate a laser beam outside the vacuumed space, and (ii) direct the laser beam towards the cleaning-related flow of ozone thereby breaking the cleaning-related flow of ozone to provide cleaning elements for cleaning the optical element.

Dependencies are inferred from the claim text.