US 2026/0177938 A1 · MEASUREMENT DEVICE, LITHOGRAPHY SYSTEM AND EXPOSURE APPARATUS, AND CONTROL METHOD, OVERLAY MEASUREMENT METHOD AND DEVICE MANUFACTURING METHOD

Abstract

A measurement device has: a slider which holds a substrate and is movable parallel to the XY plane; a drive system that drives the slider; a position measurement system which emits beams from a head section to a measurement surface in which grating section are provided on the slider, which receives respective return beams of the beams from the measurement surface, and which is capable of measuring position information in at least directions of three degrees of freedom including the absolute position coordinates of the slider; a mark detection system that detects a mark on the substrate; and a controller which detects the marks on the substrate using the mark detection system while controlling the drive of the slider, and which obtains the absolute position coordinates of each mark based on the detection result of each mark and measurement information by the position measurement system at the time of detection.

Claims19

Dependent claims

A measurement device that acquires position information of marks formed on a substrate which is held on a substrate holder provided in an exposure apparatus and to which exposure process is performed, the measurement device comprising:

a first detection system that detects each of a plurality of marks provided at each of a plurality of divided areas formed on the substrate;
a stage that is movable and configured to hold the substrate on a holding member different from the substrate holder;
a position measurement system capable of acquiring position information of the stage in a reference coordinate system;
and
a controller that obtains position information of each of the plurality of marks, based on a detection result of the first detection system and the position information of the stage acquired by the position measurement system, obtains position information of each of the plurality of divided areas from the position information of the plurality of marks, and obtains grid information that represents an arrangement information of the plurality of divided areas wherein
the controller compares the grid information obtained from the substrate processed by the exposure apparatus with a grid information as reference previously stored obtaining from a substrate processed by an exposure apparatus as reference.

3 more elements

A measurement method to obtain position information of plurality of marks formed on a substrate through exposure process by an exposure apparatus having a substrate holder on which the substrate being held, the measurement method comprising:

moving the substrate by a stage having a holding member on which the substrate being held, the holding member being different from the substrate holder;
detecting each of the plurality of marks formed on the substrate by a first detection system;
acquiring position information of the stage in a reference coordinate system by a position measurement system;
obtaining position information of each of the plurality of marks provided at each of a plurality of divided areas on the substrate, based on a detection result of the first detection system and the position information of the stage acquired by the position measurement system;
obtaining position information of each of the plurality of divided areas from the position information of the plurality of marks;
obtaining grid information that represents an arrangement information of the plurality of divided areas;
and
comparing the grid information obtained from the substrate processed by the exposure apparatus with a grid information as reference obtained from a substrate processed by an exposure apparatus as reference.

5 more elements

Dependencies are inferred from the claim text.

Measurement device, lithography system and exposure apparatus, and control method, overlay measurement method and device manufacturing method

Life of this patent

Measurement device, lithography system and exposure apparatus, and control method, overlay measurement method and device manufacturing method

Life of this patent

Abstract

Claims19