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US 2026/0177525 A1Published application
Nanopore fluidic device and methods of making the same
AssigneeIllumina, Inc.
InventorsBlake Bloomfield, Arjun Nair, Mario Vazquez Garcia, Sharis Minassian
Life of this patent
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Abstract
A nanopore fluidic device includes a support structure having a top hydrophobic surface and having hydrophilic sidewalls defining a plurality of trans wells; a trans electrode associated with each of the plurality of trans wells; one or more cis wells facing the plurality of trans wells; and a cis electrode associated with each of the one or more cis wells.
Claims27
A nanopore fluidic device, comprising:
- a support structure having a top hydrophobic surface and having hydrophilic sidewalls defining a plurality of trans wells;
- a trans electrode associated with each of the plurality of trans wells;
- one or more cis wells facing the plurality of trans wells;
- and
- a cis electrode associated with each of the one or more cis wells.
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A method, comprising:
- forming a material stack by:
- depositing a first photoresist having a first surface energy over a substrate;
- soft baking the first photoresist;
- depositing a second photoresist having a second surface energy that is lower than the first surface energy over the first photoresist;
- and
- soft baking the second photoresist;
- exposing a portion of the material stack to ultraviolet light, thereby forming an insoluble support structure, whereby another portion of the material stack remains soluble;
- and
- removing the soluble other portion, thereby forming a plurality of trans wells in the insoluble support structure.
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A method, comprising:
- depositing a first photoresist over a substrate;
- soft baking the first photoresist;
- exposing a portion of the first photoresist to ultraviolet light, thereby forming an insoluble support structure, whereby another portion of the first photoresist remains soluble;
- removing the soluble other portion of the first photoresist, thereby forming a plurality of trans wells in the insoluble support structure;
- exposing a surface of the insoluble support structure to a plasma, thereby increasing a surface energy of the insoluble support structure;
- and
- laminating a second photoresist to the surface of the insoluble support structure.
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Dependencies are inferred from the claim text.