Method for manufacturing processed substrate, method for processing substrate, pattern formation method, and cleaning liquid

Abstract

A method for manufacturing a processed substrate having a surface in which at least a part of a region is modified includes a step of exposing a surface of a substrate to a surface modifier containing a compound having a bonding property to the substrate, and a step of cleaning the substrate after the exposure with a cleaning liquid and performing film formation while controlling the compound in a plane direction and a height direction of the substrate to obtain a processed substrate. The cleaning liquid in which a distance Ra between a Hansen solubility parameter of the compound and a Hansen solubility parameter of the cleaning liquid satisfies a relationship of (Ra)2≤128 is selected and used.

Dependencies are inferred from the claim text.