Treatment liquid, treatment method for object to be treated, treatment method of pad, and manufacturing method of electronic device
AssigneeFUJIFILM Corporation
InventorsShimpei YAMADA, Tetsuya KAMIMURA, Daiyo MIURA
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Abstract
An object of the present invention is to provide a treatment liquid which can suppress corrosion of tungsten or molybdenum, has excellent organic residue removability, and further has excellent iron oxide residue removability. The treatment liquid of the present invention contains a specific compound represented by Formula (1), and at least one phosphonic acid compound selected from the group consisting of phosphonic acid and an organic phosphonic acid, in which a mass ratio of a content of the specific compound to a content of the phosphonic acid compound is 0.001 to 20.0.
Claims20
A treatment liquid comprising:
- a specific compound represented by Formula (1);
- and
- at least one phosphonic acid compound selected from the group consisting of phosphonic acid and an organic phosphonic acid,
- wherein a mass ratio of a content of the specific compound to a content of the phosphonic acid compound is 0.001 to 20.0,
- in Formula (1), X1 to X4 and R each independently represent a hydrogen atom or an aliphatic hydrocarbon group which may have a hydroxyl group or an amino group, a plurality of R's may be the same or different from each other, a plurality of R's may be bonded to each other to form a ring, and
- n is an integer of 2 or more.
Dependencies are inferred from the claim text.