Diaphragm type substrate processing device

Abstract

A diaphragm type substrate processing device for carrying and processing a circular substrate includes a carrying base, a carrier and an isolation structure. The carrying base includes a negative pressure chamber. The carrier includes an outer frame and a diaphragm installed in the outer frame, an outer edge of the diaphragm is fixed to the outer frame, and the diaphragm is stacked on the carrying base to close the negative pressure chamber, the diaphragm includes a working surface configured to be corresponding to the negative pressure chamber and provided with a plurality of through holes penetrating through the diaphragm. The isolation structure is for carrying the circular substrate and protruded from the working space of the diaphragm, so that the circular substrate is spaced apart from the working space of the diaphragm.

Dependencies are inferred from the claim text.