Substrate treatment apparatus and guard determination method

Abstract

A substrate treatment apparatus includes: a substrate holder that holds a substrate; a liquid nozzle that supplies a treatment liquid to the substrate held by the substrate holder; a guard that has a cylindrical shape, surrounds the substrate holder, and receives the treatment liquid scattered from a peripheral edge of the substrate; a guard raising and lowering mechanism that raises and lowers the guard; a camera that is provided obliquely above the substrate holder and captures an image of an image capturing region including the guard to generate a captured image; and a controller that outputs a control signal for moving the guard to a predetermined height position to the guard raising and lowering mechanism, and determines presence or absence of an abnormality related to a position or a shape of the guard based on the captured image.

Dependencies are inferred from the claim text.