Adjustable mirror arrangements for process chambers, and related methods and apparatus
AssigneeApplied Materials, Inc.
InventorAbbas RASTEGAR
Life of this patent
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Abstract
The present disclosure relates to a heating apparatus including adjustable mirrors for process chambers, and related methods and apparatus for semiconductor manufacturing. In one or more embodiments, a process chamber includes a chamber body at least partially defining a processing volume. A substrate support is disposed in the processing volume. A plurality of heat sources are operable to heat the processing volume. A support plate is disposed outwardly of the processing volume. One or more reflective surfaces are mounted to the support plate. The one or more reflective surfaces are operable to direct radiation to a target location in the processing volume by moving about at least one axis.
Claims20
A process chamber, comprising:
- a chamber body at least partially defining a processing volume;
- a substrate support disposed in the processing volume;
- a plurality of heat sources operable to heat the processing volume;
- a support plate disposed outwardly of the processing volume;
- and
- one or more reflective surfaces mounted to the support plate, the one or more reflective surfaces operable to direct radiation to a target location in the processing volume by moving about at least one axis.
A process chamber, comprising:
- a chamber body at least partially defining a processing volume;
- a substrate support disposed in the processing volume;
- a gas inlet formed at least partially in a sidewall of the chamber body;
- and
- a heat assembly comprising:
- a digital micromirror device (DMD) operable to direct energy to a target location in the processing volume, and
- a heat source oriented to emit the energy toward the DMD.
A method of heating a substrate comprising:
- positioning a substrate on a substrate support disposed within a processing volume;
- emitting energy from one or more heat sources and toward the substrate;
- pivoting at least one reflective surface to direct reflected energy toward a region of the substrate;
- and
- generating a pattern of radiation on the substrate using the reflected energy.
Dependencies are inferred from the claim text.